Deep reactive ion etching of sub-micrometer trenches with ultra high aspect ratio

Microscopic uniformity in plasma etching

Richard A. Gottscho, C. W. Jurgensen, D. J. Vitkavage · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1992 · 615 citations

Engineering, Electrical Engineering, Materials Science +17

Black nonreflecting silicon surfaces for solar cells

S. Koynov, Martin S. Brandt, M. Stutzmann · Applied Physics Letters · 2006 · 433 citations

Engineering, Materials Engineering, Materials Science +17

Low-temperature reactive ion etching and microwave plasma etching of silicon

S. Tachi, Kazunori Tsujimoto, Sadayuki Okudaira · Applied Physics Letters · 1988 · 333 citations

Engineering, Materials Engineering, Materials Science +16

Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures

Frédéric Marty, Lionel Rousseau, Bassam Saadany et al. · Microelectronics Journal · 2005 · 300 citations

Engineering, Materials Engineering, Materials Science +17

A batch-fabricated and electret-free silicon electrostatic vibration energy harvester

Philippe Basset, Dimitri Galayko, Ayyaz Mahmood Paracha et al. · Journal of Micromechanics and Microengineering · 2009 · 225 citations · Full text

Engineering, Electrical Engineering, Mechanical Engineering +15