Molecular simulation of pattern formation in electron beam lithography

Electron-beam fabrication of 80-Å metal structures

A. N. Broers, W. W. Molzen, J. J. Cuomo et al. · Applied Physics Letters · 1976 · 306 citations

Engineering, Materials Engineering, Materials Science +15

Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography

Joel K. W. Yang, B. Cord, Huigao Duan et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2009 · 181 citations · Full text

Natural Sciences, Electrical Engineering, Materials Science +13

Monte Carlo simulation of fast secondary electron production in electron beam resists

Kenji Murata, David F. Kyser, C. H. Ting · Journal of Applied Physics · 1981 · 177 citations

Engineering, Materials Engineering, Materials Science +17

Proximity effect correction for electron beam lithography by equalization of background dose

G. Owen, Paul Rissman · Journal of Applied Physics · 1983 · 114 citations

Medicine, Electrical Engineering, Radiation Dosimetry +14

Thermal and acid-catalyzed deprotection kinetics in candidate deep ultraviolet resist materials

G. M. Wallraff, John M. Hutchinson, William D. Hinsberg et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1994 · 69 citations

Natural Sciences, Materials Engineering, Materials Science +14