Effects of precursors on nucleation in atomic layer deposition of HfO2

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M. Copel, M. Gribelyuk, Evgeni Gusev · Applied Physics Letters · 2000 · 667 citations

Natural Sciences, Materials Engineering, Materials Science +17

Growth of ZnO/Al₂O₃ Alloy Films Using Atomic Layer Deposition Techniques

Jeffrey W. Elam, Steven M. George · Chemistry of Materials · 2003 · 368 citations

Natural Sciences, Materials Engineering, Materials Science +17

Thermodynamic stability of high-<i>K</i> dielectric metal oxides ZrO2 and HfO2 in contact with Si and SiO2

Maciej Gutowski, John E. Jaffe, Chunli Liu et al. · Applied Physics Letters · 2002 · 364 citations

Natural Sciences, Materials Engineering, Materials Science +17

Chemical vapor deposition and characterization of HfO2 films from organo-hafnium compounds

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Natural Sciences, Materials Engineering, Materials Science +9

Thin film atomic layer deposition equipment for semiconductor processing

Ofer Sneh, R. Clark-Phelps, A. Londergan et al. · Thin Solid Films · 2002 · 290 citations

Natural Sciences, Materials Engineering, Materials Science +12