Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films

Kristel Möls, Lauri Aarik, Hugo Mändar, +4

Optical Materials

Materials ScienceOptical MaterialsEngineeringOptical PropertiesOxide Electronics +5

Atomic layer deposition of TiO2 from TiCl4 and O3

Lauri Aarik, Tõnis Arroval, Raul Rammula, +3

Thin Solid Films

Materials EngineeringMaterials ScienceEngineeringSurface ScienceChemical Deposition +2

Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films

Tõnis Arroval, Lauri Aarik, Raul Rammula, +2

Thin Solid Films

Materials ScienceEngineeringSurface ScienceApplied PhysicsAluminum–titanium Oxide Films +7

Effects of precursors on nucleation in atomic layer deposition of HfO2

Jaan Aarik, Aleks Aidla, Arvo Kikas, +5

Applied Surface Science

Chemical EngineeringEpitaxial GrowthEngineeringSurface ScienceApplied Physics +7

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

Lauri Aarik, Tõnis Arroval, Raul Rammula, +6

Thin Solid Films

Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics +8

Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

Raul Rammula, Jaan Aarik, Hugo Mändar, +2

Applied Surface Science

Materials ScienceOptical MaterialsEngineeringGrowth RateSurface Science +7

Atomic layer deposition of Cr2O3 thin films: Effect of crystallization on growth and properties

Aivar Tarre, Jaan Aarik, Hugo Mändar, +6

Applied Surface Science

Materials ScienceEngineeringCr2o3 Thin FilmsSurface ScienceApplied Physics +6

Influence of carrier gas pressure and flow rate on atomic layer deposition of HfO2 and ZrO2 thin films

Jaan Aarik, Aleks Aidla, Aarne Kasikov, +3

Applied Surface Science

Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics +7

Impact of plasma treatment on electrical properties of TiO₂/RuO₂based DRAM capacitor

Boris Hudec, K. Hušeková, A. Rosová, +8

Journal of Physics D Applied Physics

Materials ScienceElectrical EngineeringEngineeringElectrode-electrolyte InterfaceTio2/ruo2 Interface +12

Structural characterization of TiO2–Cr2O3 nanolaminates grown by atomic layer deposition

Väino Sammelselg, Aivar Tarre, Jun Lu, +7

Surface and Coatings Technology

Materials EngineeringMaterials ScienceMaterial AnalysisEngineeringNanomaterials +8