Concepedia

Tõnis Arroval

TA

15

Publications

396

Citations

14

H-Index

2011

Active since

Affiliations

University of Tartu(Current)

Institute of Electrical Engineering of the Slovak Academy of Sciences

Slovak Academy of Sciences

University of Helsinki

Tõnis Arroval is an author at University of Tartu specializing in materials science, engineering, and applied physics.

Top concepts

EngineeringMaterial ScienceApplied PhysicsSurface ScienceThin FilmsMaterials EngineeringElectrical EngineeringChemistryMicroelectronicsTitanium Dioxide Materials

Publications per year

2011–2020

15

Publications

15

Atomic layer deposition of TiO2 from TiCl4 and O3

Lauri Aarik, Tõnis Arroval, Raul Rammula et al. · Thin Solid Films · 2013 · 78 citations

Materials Engineering, Materials Science, Engineering +4

Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films

Tõnis Arroval, Lauri Aarik, Raul Rammula et al. · Thin Solid Films · 2016 · 52 citations

Materials Science, Engineering, Surface Science +9

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

Lauri Aarik, Tõnis Arroval, Raul Rammula et al. · Thin Solid Films · 2014 · 38 citations

Materials Science, Engineering, Oxide Electronics +10

Atomic layer deposition of Ru films from bis(2,5-dimethylpyrrolyl)ruthenium and oxygen

Kaupo Kukli, Jaan Aarik, Aleks Aidla et al. · Thin Solid Films · 2011 · 30 citations

Materials Science, Inorganic Chemistry, Transition Metal Chalcogenides +9

Atomic layer deposition of ferromagnetic iron oxide films on three-dimensional substrates with tin oxide nanoparticles

Aile Tamm, Mukesh C. Dimri, Jekaterina Kozlova et al. · Journal of Crystal Growth · 2012 · 28 citations

Materials Science, Magnetism, Ferromagnetism +12

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