Development of a thin ceramic-graphene nanolaminate coating for corrosion protection of stainless steel

Jayanta Mondal, A.G. Marques, Lauri Aarik, +3

Corrosion Science

Materials ScienceChemical EngineeringCorrosion ProtectionEngineeringStainless Steel +5

Influence of phase composition on optical properties of TiO2: Dependence of refractive index and band gap on formation of TiO2-II phase in thin films

Kristel Möls, Lauri Aarik, Hugo Mändar, +4

Optical Materials

Materials ScienceOptical MaterialsEngineeringOptical PropertiesOxide Electronics +5

Atomic layer deposition of TiO2 from TiCl4 and O3

Lauri Aarik, Tõnis Arroval, Raul Rammula, +3

Thin Solid Films

Materials EngineeringMaterials ScienceEngineeringSurface ScienceChemical Deposition +2

Effect of substrate-enhanced and inhibited growth on atomic layer deposition and properties of aluminum–titanium oxide films

Tõnis Arroval, Lauri Aarik, Raul Rammula, +2

Thin Solid Films

Materials ScienceEngineeringSurface ScienceApplied PhysicsAluminum–titanium Oxide Films +7

Effective corrosion protection of aluminum alloy AA2024-T3 with novel thin nanostructured oxide coating

Maido Merisalu, Lauri Aarik, Jekaterina Kozlova, +3

Surface and Coatings Technology

Materials EngineeringMaterials ScienceChemical EngineeringThin Ceramic CoatingEngineering +13

Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

Lauri Aarik, Tõnis Arroval, Raul Rammula, +6

Thin Solid Films

Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics +8

Chemical resistance of thin film materials based on metal oxides grown by atomic layer deposition

Väino Sammelselg, Ivan Netšipailo, Aleks Aidla, +5

Thin Solid Films

Materials ScienceEngineeringCorrosionOxide ElectronicsSurface Science +8

Temperature induced inversion of oxygen response in CVD graphene on SiO2

Raivo Jaaniso, Tauno Kahro, Jekaterina Kozlova, +8

Sensors and Actuators B Chemical

Graphene NanomeshesEngineeringNanomaterialsNanotechnologySurface Science +6

Influence of process parameters on atomic layer deposition of ZrO2 thin films from CpZr(NMe2)3 and H2O

Lauri Aarik, Harry Alles, Aleks Aidla, +8

Thin Solid Films

Materials ScienceEngineeringProcess ParametersOxide ElectronicsSurface Science +7

Atomic layer deposition of rutile-phase TiO2 on RuO2 from TiCl4 and O3: Growth of high-permittivity dielectrics with low leakage current

Jaan Aarik, Tõnis Arroval, Lauri Aarik, +6

Journal of Crystal Growth

Materials EngineeringMaterials ScienceMaterial AnalysisEngineeringSurface Science +5