Atomic layer deposition of TiO2 from TiCl4 and O3 - Concepedia

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Atomic layer deposition of TiO2 from TiCl4 and O3

78

Citations

49

References

2013

Year

Lauri Aarik, Tõnis Arroval, Raul Rammula, Hugo Mändar, Väino Sammelselg, Jaan Aarik

Thin Solid Films

Materials EngineeringMaterials ScienceEngineeringSurface ScienceChemical DepositionChemical Vapor DepositionAtomic Layer Deposition

References

	Year	Citations

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