Concepedia

Dennis M. Hausmann

DM

33

Publications

3K

Citations

26

H-Index

2001

Active since

Affiliations

Lam Research (United States)(Current)

Colorado School of Mines

Eindhoven University of Technology

Harvard University

University College Cork

Dennis M. Hausmann is an author at Lam Research (United States) specializing in engineering, surface science, and materials science.

Top concepts

EngineeringSurface ScienceMaterial ScienceApplied PhysicsChemistryThin FilmsSurface ChemistryChemical EngineeringMaterials EngineeringNanotechnology

Publications per year

2001–2024

33

Publications

33

Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors

Dennis M. Hausmann, Esther Kim, Jill Becker et al. · Chemistry of Materials · 2002 · 519 citations

Materials Science, Materials Engineering, Surface Technology +14

A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches

Roy G. Gordon, Dennis M. Hausmann, E. Kim et al. · Chemical Vapor Deposition · 2003 · 386 citations

Engineering, Material Simulation, Step Coverage +19

Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films

Dennis M. Hausmann, Roy G. Gordon · Journal of Crystal Growth · 2003 · 306 citations

Materials Science, Engineering, Oxide Electronics +8

Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates

Dennis M. Hausmann, Jill Becker, Shenglong Wang et al. · Science · 2002 · 226 citations

Materials Science, Materials Engineering, Chemical Engineering +13

Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru

Dara Bobb-Semple, Katie L. Nardi, Nerissa Draeger et al. · Chemistry of Materials · 2019 · 183 citations

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