Dennis M. Hausmann - Concepedia

Author

Dennis M. Hausmann

Lam Research (United States)

Also Known As

D. Hausmann, Dennis M. Hausmann, Dennis Hausmann, Dennis M. Hausmann

Publications

Citations

H-Index

Concepts

All Affiliations

Lam Research (United States)Colorado School of Mines Eindhoven University of Technology Harvard University University College Cork

About

Dennis M. Hausmann is an author at Lam Research (United States) specializing in engineering, surface science, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	19	24	2.4K
2	Applied Physics	17	20	1.8K
3	Chemistry	16	18	1.2K
4	Chemical Engineering	10	10	684
5	Natural Sciences	6	6	623

Dennis M. Hausmann

Publications

Citations

H-Index

Page 1

	Year	Citations
Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors Dennis M. Hausmann, Esther Kim, Jill Becker, Chemistry of Materials Materials ScienceMaterials EngineeringSurface TechnologyEngineeringZirconium Oxides	2002	519
A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches Roy G. Gordon, Dennis M. Hausmann, E. Kim, Chemical Vapor Deposition EngineeringMaterial SimulationStep CoverageWater VaporChemical Deposition	2003	386
Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films Dennis M. Hausmann, Roy G. Gordon Journal of Crystal Growth Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied Physics	2003	306
Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates Dennis M. Hausmann, Jill Becker, Shenglong Wang, Science Materials ScienceMaterials EngineeringChemical EngineeringRapid Vapor DepositionEngineering	2002	226
Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru Dara Bobb-Semple, Katie L. Nardi, Nerissa Draeger, Chemistry of Materials	2019	183
Vapor Deposition of Metal Oxides and Silicates: Possible Gate Insulators for Future Microelectronics Roy G. Gordon, Jill Becker, Dennis M. Hausmann, Chemistry of Materials EngineeringNew Chemical ReactionsVacuum DeviceChemical DepositionSilicon On Insulator	2001	131
Atomic layer deposition of silicon-based dielectrics for semiconductor manufacturing: Current status and future outlook Rafaiel A. Ovanesyan, Ekaterina A. Filatova, Simon D. Elliott, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringSic FilmsThin Film Process TechnologyChemical DepositionSilicon On Insulator	2019	114
Tuning Material Properties of Oxides and Nitrides by Substrate Biasing during Plasma-Enhanced Atomic Layer Deposition on Planar and 3D Substrate Topographies Tahsin Faraz, Harm C. M. Knoops, Marcel A. Verheijen, ACS Applied Materials & Interfaces	2018	108
Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom? Kenji Ishikawa, Kazuhiro Karahashi, Tatsuo Ishijima, Japanese Journal of Applied Physics EngineeringTarget FabricationSoft MatterCritical Dimension UniformityDry Processes	2018	95
Review Article: Recommended reading list of early publications on atomic layer deposition—Outcome of the “Virtual Project on the History of ALD” Esko Ahvenniemi, Andrew R. Akbashev, Saima Ali, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films EngineeringThin Film Process TechnologyChemistryChemical DepositionSurface Technology	2016	94

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