Jill Becker

Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors

Dennis M. Hausmann, Esther Kim, Jill Becker et al. · Chemistry of Materials · 2002 · 519 citations

Materials Science, Materials Engineering, Surface Technology +14

Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates

Dennis M. Hausmann, Jill Becker, Shenglong Wang et al. · Science · 2002 · 226 citations

Materials Science, Materials Engineering, Chemical Engineering +13

Highly Conformal Thin Films of Tungsten Nitride Prepared by Atomic Layer Deposition from a Novel Precursor

Jill Becker, Seigi Suh, Shenglong Wang et al. · Chemistry of Materials · 2003 · 143 citations

Diffusion barrier properties of tungsten nitride films grown by atomic layer deposition from bis(<i>tert</i>-butylimido)bis(dimethylamido)tungsten and ammonia

Jill Becker, Roy G. Gordon · Applied Physics Letters · 2003 · 143 citations

Tungsten Metal, Engineering, Tungsten Nitride Films +16

Vapor Deposition of Metal Oxides and Silicates:  Possible Gate Insulators for Future Microelectronics

Roy G. Gordon, Jill Becker, Dennis M. Hausmann et al. · Chemistry of Materials · 2001 · 131 citations

Engineering, New Chemical Reactions, Vacuum Device +20