Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors

Dennis M. Hausmann, Esther Kim, Jill Becker, +1

Chemistry of Materials

Materials ScienceMaterials EngineeringSurface TechnologyEngineeringZirconium Oxides +12

Rapid Vapor Deposition of Highly Conformal Silica Nanolaminates

Dennis M. Hausmann, Jill Becker, Shenglong Wang, +1

Science

Materials ScienceMaterials EngineeringChemical EngineeringRapid Vapor DepositionEngineering +11

Highly Conformal Thin Films of Tungsten Nitride Prepared by Atomic Layer Deposition from a Novel Precursor

Jill Becker, Seigi Suh, Shenglong Wang, +1

Chemistry of Materials

Diffusion barrier properties of tungsten nitride films grown by atomic layer deposition from bis(<i>tert</i>-butylimido)bis(dimethylamido)tungsten and ammonia

Jill Becker, Roy G. Gordon

Applied Physics Letters

Tungsten MetalEngineeringTungsten Nitride FilmsDiffusion Barrier PropertiesMetallic Nanomaterials +14

Vapor Deposition of Metal Oxides and Silicates:  Possible Gate Insulators for Future Microelectronics

Roy G. Gordon, Jill Becker, Dennis M. Hausmann, +1

Chemistry of Materials

EngineeringNew Chemical ReactionsVacuum DeviceChemical DepositionSilicon On Insulator +18

Atomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides

Jill Becker, Esther Kim, Roy G. Gordon

Chemistry of Materials

Materials ScienceBoron NitrideEngineeringElectron MicroscopyPrecursor Vapors +10

Autonomous Molecular Design: Then and Now

Tanja Dimitrov, Christoph Kreisbeck, Jill Becker, +2

ACS Applied Materials & Interfaces

Deep Machine LearningMachine LearningEngineeringAutomated SynthesisMolecular Biology +14

Tungsten Nitride Inverse Opals by Atomic Layer Deposition

Alessandro Rugge, Jill Becker, Roy G. Gordon, +1

Nano Letters

Materials ScienceInverse Opal StructuresIi-vi SemiconductorMaterial AnalysisEngineering +12

Atomic Layer Deposition of Molybdenum Oxide Using Bis(Tert-Butylimido)Bis(Dimethylamido) Molybdenum

Adam Bertuch, Laurent Lecordier, Mark J. Dalberth, +6

ECS Meeting Abstracts

Inorganic ChemistryAbstract AlgebraEngineeringSurface ScienceAbstract Object Theory +5

Atomic Layer Deposition of AlN with Tris(Dimethylamido)Aluminum and NH₃

Liu Guo, Eric Deguns, Laurent Lecordier, +2

ECS Transactions

Materials EngineeringMaterials ScienceElectrical EngineeringAluminum NitrideHigh Temperature Materials +12