Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors - Concepedia

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Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

38

Citations

33

References

2014

Year

Lauri Aarik, Tõnis Arroval, Raul Rammula, Hugo Mändar, Väino Sammelselg, Boris Hudec, K. Hušeková, K. Fröhlich, Jaan Aarik

Thin Solid Films

Materials ScienceEngineeringOxide ElectronicsSurface ScienceApplied PhysicsHydrogen-free PrecursorsChemical Vapor DepositionThin Film Process TechnologyThin FilmsChemical DepositionHigh-quality Al2o3Atomic Layer DepositionThin Film Processing

References

	Year	Citations

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