Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films - Concepedia

Concepedia

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Atomic layer deposition of HfO2: Effect of structure development on growth rate, morphology and optical properties of thin films

35

Citations

47

References

2010

Year

Raul Rammula, Jaan Aarik, Hugo Mändar, Peeter Ritslaid, Väino Sammelselg

Applied Surface Science

Materials ScienceOptical MaterialsEngineeringGrowth RateSurface ScienceApplied PhysicsThin FilmsChemical DepositionEpitaxial GrowthChemical Vapor DepositionAtomic Layer DepositionThin Film Processing

References

	Year	Citations

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