Plasma etching: principles, mechanisms, application to micro- and nano-technologies

Ion- and electron-assisted gas-surface chemistry—An important effect in plasma etching

J. W. Coburn, Harold F. Winters · Journal of Applied Physics · 1979 · 723 citations

Volatile Reaction Products, Chemical Engineering, Engineering +13

Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, JJ Beulens, M. Schaepkens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 250 citations

Fluorocarbon Film Growth, Engineering, Silicon On Insulator +17

Polymerization of fluorocarbons in reactive ion etching plasmas

W. W. Stoffels, E. Stoffels, Kunihide Tachibana · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 153 citations · Full text

Materials Science, Chemical Engineering, Polymerization Reactions +15

Low-temperature dry etching

S. Tachi, Kazunori Tsujimoto, Shin Arai et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1991 · 148 citations

Engineering, Plasma Processing, Highly Selective Anisotropic +16

Plasma-Assisted Etching in Microfabrication

J. W. Coburn, Harold F. Winters · Annual Review of Materials Science · 1983 · 80 citations

Materials Engineering, Materials Science, Room Temperature +11