Marie-Claude Peignon

Plasma etching: principles, mechanisms, application to micro- and nano-technologies

Christophe Cardinaud, Marie-Claude Peignon, Pierre‐Yves Tessier · Applied Surface Science · 2000 · 225 citations

Materials Science, Engineering, Microfabrication +8

Langmuir probe measurements in an inductively coupled plasma: Electron energy distribution functions in polymerizing fluorocarbon gases used for selective etching of SiO2

Freddy Gaboriau, Marie-Claude Peignon, Gilles Cartry et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 21 citations

Optical Materials, Selective Etching, Engineering +24

Roughness and chemistry of silicon and polysilicon surfaces etched in high-density plasma: XPS, AFM and ellipsometry analysis

L. Rolland, C. Vallée, Marie-Claude Peignon et al. · Applied Surface Science · 2000 · 13 citations

Materials Science, Surface Characterization, High-density Plasma +9

Measurements of rf bias effect in a dual electron cyclotron resonance-rf methane plasma using the Langmuir probe method

Junegie Hong, A. Granier, C. Leteinturier et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2000 · 11 citations

Langmuir Probe Method, Engineering, Plasma Science +17