JJ Beulens

Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, JJ Beulens, M. Schaepkens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 250 citations

Fluorocarbon Film Growth, Engineering, Silicon On Insulator +17

Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures

B. E. E. Kastenmeier, P. J. Matsuo, JJ Beulens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 144 citations

Engineering, Silicon On Insulator, Plasma Processing +16

A two-dimensional nonequilibrium model of cascaded arc plasma flows

JJ Beulens, Dragomir Milojevic, D.C. Schram et al. · Physics of Fluids B Plasma Physics · 1991 · 89 citations · Full text

Engineering, Two-dimensional Nonequilibrium Model, Physics +11

Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, M. F. Doemling, M. Schaepkens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 79 citations

Selective Etching, Engineering, Integrated Circuits +19

Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon

P. J. Matsuo, B. E. E. Kastenmeier, JJ Beulens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 68 citations

Engineering, Vacuum Device, Chemistry +16