M. F. Doemling

Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, JJ Beulens, M. Schaepkens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 250 citations

Fluorocarbon Film Growth, Engineering, Silicon On Insulator +17

Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, M. F. Doemling, M. Schaepkens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 79 citations

Selective Etching, Engineering, Integrated Circuits +19

Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas

M. F. Doemling, N. R. Rueger, G. S. Oehrlein · Applied Physics Letters · 1996 · 54 citations

Inverse Rie Lag, Electrical Engineering, Engineering +14

Surface science issues in plasma etching

G. S. Oehrlein, M. F. Doemling, B. E. E. Kastenmeier et al. · IBM Journal of Research and Development · 1999 · 45 citations

Polysilicon Layer, Electrical Engineering, Engineering +11

Photoresist erosion studied in an inductively coupled plasma reactor employing CHF3

M. F. Doemling, N. R. Rueger, G. S. Oehrlein et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 39 citations

Engineering, Electron-beam Lithography, Integrated Circuits +16