M. F. Doemling

Role of steady state fluorocarbon films in the etching of silicon dioxide using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, JJ Beulens, M. Schaepkens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 253 citations

Natural Sciences, Materials Engineering, Materials Science +15

Selective etching of SiO2 over polycrystalline silicon using CHF3 in an inductively coupled plasma reactor

N. R. Rueger, M. F. Doemling, M. Schaepkens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 80 citations

Natural Sciences, Materials Engineering, Materials Science +16

Observation of inverse reactive ion etching lag for silicon dioxide etching in inductively coupled plasmas

M. F. Doemling, N. R. Rueger, G. S. Oehrlein · Applied Physics Letters · 1996 · 55 citations

Natural Sciences, Materials Science, Physics +16

Surface science issues in plasma etching

G. S. Oehrlein, M. F. Doemling, B. E. E. Kastenmeier et al. · IBM Journal of Research and Development · 1999 · 45 citations

Engineering, Electrical Engineering, Materials Science +16

Photoresist erosion studied in an inductively coupled plasma reactor employing CHF3

M. F. Doemling, N. R. Rueger, G. S. Oehrlein et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 39 citations

Natural Sciences, Electrical Engineering, Materials Science +16