B. E. E. Kastenmeier

Publications

654

Citations

H-Index

1995

Active since

Affiliations

University at Albany, State University of New York(Current)

Albany State University

IBM (United States)

Air Products (United States)

University of Maryland, College Park

B. E. E. Kastenmeier is an author at University at Albany, State University of New York specializing in engineering, applied physics, and surface science.

Top concepts

EngineeringApplied PhysicsSurface ScienceMaterial ScienceMicroelectronicsMicrofabricationChemical EngineeringMaterials EngineeringChemistryIntegrated Circuits

Publications per year

1995–2005

Publications

Chemical dry etching of silicon nitride and silicon dioxide using CF4/O2/N2 gas mixtures

B. E. E. Kastenmeier, P. J. Matsuo, JJ Beulens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 144 citations

Engineering, Silicon On Insulator, Plasma Processing +16

Highly selective etching of silicon nitride over silicon and silicon dioxide

B. E. E. Kastenmeier, P. J. Matsuo, G. S. Oehrlein · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1999 · 104 citations

Engineering, Selective Etching, Integrated Circuits +16

Remote plasma etching of silicon nitride and silicon dioxide using NF3/O2 gas mixtures

B. E. E. Kastenmeier, P. J. Matsuo, G. S. Oehrlein et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1998 · 93 citations

Engineering, Integrated Circuits, Vacuum Device +17

Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon

P. J. Matsuo, B. E. E. Kastenmeier, JJ Beulens et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 68 citations

Engineering, Vacuum Device, Chemistry +16

Surface science issues in plasma etching

G. S. Oehrlein, M. F. Doemling, B. E. E. Kastenmeier et al. · IBM Journal of Research and Development · 1999 · 45 citations

Polysilicon Layer, Electrical Engineering, Engineering +11

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