D.C. Schram

Plasma chemistry aspects of a-Si:H deposition using an expanding thermal plasma

M. C. M. van de Sanden, R. J. Severens, W. M. M. Kessels et al. · Journal of Applied Physics · 1998 · 119 citations · Full text

Engineering, Chemistry, Silicon On Insulator +18

A combined Thomson–Rayleigh scattering diagnostic using an intensified photodiode array

M. C. M. van de Sanden, Guido Janssen, J. M. de Regt et al. · Review of Scientific Instruments · 1992 · 118 citations

Engineering, Laser Science, Optical Testing +21

Hydrogenated amorphous silicon deposited at very high growth rates by an expanding Ar–H2–SiH4 plasma

W. M. M. Kessels, R. J. Severens, Arno H. M. Smets et al. · Journal of Applied Physics · 2001 · 100 citations · Full text

Engineering, High Growth Rates, Plasma Processing +16

Argon-hydrogen plasma jet investigated by active and passive spectroscopic means

Rfg Ralph Meulenbroeks, Allard J. van der Beek, A. J. G. van Helvoort et al. · Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics · 1994 · 99 citations · Full text

Engineering, Argon-hydrogen Plasma Jet, Plasma Science +18

A two-dimensional nonequilibrium model of cascaded arc plasma flows

JJ Beulens, Dragomir Milojevic, D.C. Schram et al. · Physics of Fluids B Plasma Physics · 1991 · 89 citations · Full text

Engineering, Two-dimensional Nonequilibrium Model, Physics +11