W. W. Stoffels - Concepedia

Author

W. W. Stoffels

Also Known As

W W Stoffels, W. Stoffels, W. W. Stoffels, W.W. Stoffels, Winfred Stoffels, Winfred W. STOFFELS, Winfred W. Stoffels, Winfred Willem Stoffels

106

Publications

2.9K

Citations

H-Index

Concepts

All Affiliations

Eindhoven University of Technology Plasma (Russia)Biomechanics Institute of Valencia Kyoto University Universität Greifswald

About

W. W. Stoffels is an author at Eindhoven University of Technology specializing in engineering, plasma physics, and physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	23	42	2.4K
2	Applied Physics	18	28	1.2K
3	Natural Sciences	15	18	1.2K
4	Biochemistry	2	2	76
5	Medicine	1	1	61

W. W. Stoffels

Publications

2.7K

Citations

H-Index

Page 1

	Year	Citations
Plasma needle: a non-destructive atmospheric plasma source for fine surface treatment of (bio)materials E. Stoffels, A J Flikweert, W. W. Stoffels, Plasma Sources Science and Technology EngineeringPlasma PhysicsBiomedical EngineeringPlasma MedicinePlasma Processing	2002	609
Negative ions in a radio-frequency oxygen plasma E. Stoffels, W. W. Stoffels, D. Vender, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics Electrical EngineeringDominant IonEngineeringPhysicsApplied Physics	1995	171
Polymerization of fluorocarbons in reactive ion etching plasmas W. W. Stoffels, E. Stoffels, Kunihide Tachibana Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceChemical EngineeringPolymerization ReactionsEngineeringNonthermal Plasma	1998	153
Study of initial dust formation in an Ar-SiH4 discharge by laser induced particle explosive evaporation Laïfa Boufendi, Jörg Hermann, A. Bouchoule, Journal of Applied Physics EngineeringGlow DischargeLipee EmissionHigh Temperature AerosolParticle Explosive Evaporation	1994	127
Plasma chemistry and surface processes of negative ions E. Stoffels, W. W. Stoffels, G. M. W. Kroesen Plasma Sources Science and Technology EngineeringPlasma SciencePlasma PhysicsChemistryIon Process	2001	94
Production and destruction of CF<i>x</i> radicals in radio-frequency fluorocarbon plasmas M. Haverlag, W. W. Stoffels, E. Stoffels, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Cold Atmospheric PlasmaRadio-frequency Fluorocarbon PlasmasRadical EmissionEngineeringPhysics	1996	82
Instantaneous and delayed responses of line intensities to interruption of the RF power in an argon inductively coupled plasma F.H.A.G. Fey, W. W. Stoffels, J.A.M. van der Mullen, Spectrochimica Acta Part B Atomic Spectroscopy Electrical EngineeringEngineeringApplied Plasma PhysicFundamental Plasma PhysicMagnetohydrodynamics	1991	79
Micro-Disperse Particles in Plasmas: From Disturbing Side Effects to New Applications Holger Kersten, H. Deutsch, E. Stoffels, Contributions to Plasma Physics EngineeringPlasma PhysicsNew ApplicationsPlasma ProcessingPlasma Simulation	2001	71
Energy influx from an rf plasma to a substrate during plasma processing Holger Kersten, E. Stoffels, W. W. Stoffels, Journal of Applied Physics Electrical EngineeringEngineeringPhysicsOxygen PlasmaNonthermal Plasma	2000	71
Measurements of radical densities in radio-frequency fluorocarbon plasmas using infrared absorption spectroscopy M. Haverlag, E. Stoffels, W. W. Stoffels, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Radical EmissionEngineeringAtomic Emission SpectroscopyAbsorption SpectroscopyPlasma Physics	1994	69

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