Applied Physics Letters · 1999 · 81 citations · 10 references
EngineeringMaterials EngineeringMaterials ScienceOptoelectronicsPhotonicsSemiconductor MaterialsLaser PhysicsOptical SourcesPhotonic MaterialsSemiconductor Device MaterialsSemiconductor LasersWide-bandgap Semiconductor DevicesDistributed Bragg Reflector LasersGallium Nitride (Gan) MaterialsHeterostructure LasersLaser Gain MaterialsLaser MaterialsMetalorganic Vapor Phase EpitaxySemiconductor Laser FabricationVertical-cavity Surface-emitting Lasers
We report photopumped room-temperature surface-mode lasing at 401 nm in a InGaAlN vertical-cavity surface-emitting laser grown on a sapphire substrate using metal–organic vapor-phase epitaxy. A 2λ cavity was formed by a quarter-wave Al0.15Ga0.85N/GaN distributed Bragg reflector on the one side of the active layer and a GaN–air interface on the other. A multilayer structure composed of 12-fold-stacked ultrathin InGaN insertions in a GaN matrix served as an active layer providing ultrahigh material gain and making possible vertical lasing without use of the upper Bragg reflector.
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Isamu Akasaki Isamu Akasaki, Hiroshi Amano · Japanese Journal of Applied Physics · 1997 · 661 citations · Full text