High quality SiO2 depositions from TEOS by ECR plasma

Reaction Mechanisms of Plasma‐ and Thermal‐Assisted Chemical Vapor Deposition of Tetraethylorthosilicate Oxide Films

S. Nguyen, D. Dobuzinsky, D. Harmon et al. · Journal of The Electrochemical Society · 1990 · 91 citations

Natural Sciences, Materials Engineering, Materials Science +17

Hot-carrier aging of the MOS transistor in the presence of spin-on glass as the interlevel dielectric

N. Lifshitz, G. Smolinsky · IEEE Electron Device Letters · 1991 · 44 citations

Engineering, Electrical Engineering, Materials Science +17

Deposition of silicon oxide films from TEOS by low frequency plasma chemical vapor deposition

Gen Tochitani, M. Shimozuma, Hiroaki Tagashira · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1993 · 43 citations

Natural Sciences, Materials Science, Physics +17

Dependence of Deposition Characteristics on Base Materials in TEOS and Ozone CVD at Atmospheric Pressure

K. Fujino, Yuko Nishimoto, N. Tokumasu et al. · Journal of The Electrochemical Society · 1991 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +16

Ballistic transport-reaction prediction of film conformality in tetraethoxysilane O2 plasma enhanced deposition of silicon dioxide

T.S. Cale, Gregory B. Raupp, T. H. Gandy · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1992 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +17