Sunil Wickramanayaka

Heterogeneous 2.5D integration on through silicon interposer

Xiaowu Zhang, Jong Kai Lin, Sunil Wickramanayaka et al. · Applied Physics Reviews · 2015 · 163 citations · Full text

Engineering, Computer Engineering, Electrical Engineering +17

Remote Hydrogen Plasma Chemical Vapor Deposition of Amorphous Hydrogenated Silicon-Carbon Films from an Organosilane Molecular Cluster as a Novel Single-Source Precursor: Structure, Growth Mechanism, and Properties of the Deposit

A. M. Wróbel, Sunil Wickramanayaka, Y. Nakanishi et al. · Chemistry of Materials · 1995 · 56 citations

Natural Sciences, Materials Engineering, Materials Science +14

Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon−Carbon and Silica Films from Organosilicon Sources

A. M. Wróbel, A. Walkiewicz‐Pietrzykowska, Yoshinori Hatanaka et al. · Chemistry of Materials · 2001 · 36 citations

Natural Sciences, Chemistry, Materials Engineering +17

Remote hydrogen plasma chemical vapor deposition using an organopentasilane cluster as a novel film-forming precursor: Mechanism of the activation step

A. M. Wróbel, Sunil Wickramanayaka, Yoshinori Hatanaka · Journal of Applied Physics · 1994 · 35 citations

Natural Sciences, Chemistry, Materials Science +13

High quality SiO2 depositions from TEOS by ECR plasma

Keiichiro Sano, Shigenori Hayashi, Sunil Wickramanayaka et al. · Thin Solid Films · 1996 · 34 citations

Natural Sciences, Materials Engineering, Materials Science +9