A. Walkiewicz‐Pietrzykowska

Remote hydrogen–nitrogen plasma chemical vapor deposition from a tetramethyldisilazane source. Part 1. Mechanism of the process, structure and surface morphology of deposited amorphous hydrogenated silicon carbonitride filmsElectronic supplementary information (ESI) available: deconvoluted emission and IR spectra of a-Si–N–C–H films. See http://www.rsc.org/suppdata/jm/b2/b211415c/

A. M. Wróbel, I. Błaszczyk, A. Walkiewicz‐Pietrzykowska et al. · Journal of Materials Chemistry · 2003 · 58 citations

Natural Sciences, Materials Engineering, Materials Science +16

Oligomerization and Polymerization Steps in Remote Plasma Chemical Vapor Deposition of Silicon−Carbon and Silica Films from Organosilicon Sources

A. M. Wróbel, A. Walkiewicz‐Pietrzykowska, Yoshinori Hatanaka et al. · Chemistry of Materials · 2001 · 36 citations

Natural Sciences, Chemistry, Materials Engineering +17

Remote hydrogen plasma chemical vapor deposition of silicon–carbon thin‐film materials from a hexamethyldisilane source: Characterization of the process and the deposits

A. M. Wróbel, A. Walkiewicz‐Pietrzykowska, J.E. Klemberg-Sapieha et al. · Journal of Applied Polymer Science · 2002 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +15

Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films

A. M. Wróbel, A. Walkiewicz‐Pietrzykowska, J.E. Klemberg-Sapieha et al. · Chemistry of Materials · 2003 · 35 citations

Natural Sciences, Materials Engineering, Materials Science +17

Mechanism of the Initiation Step in Atomic Hydrogen-Induced CVD of Amorphous Hydrogenated Silicon–Carbon Films from Single-Source Precursors

A. M. Wróbel, A. Walkiewicz‐Pietrzykowska · Chemical Vapor Deposition · 1998 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +17