Concepedia

N. Tokumasu

NT

9

Publications

263

Citations

9

H-Index

1990

Active since

Affiliations

Semiconductor Energy Laboratory (Japan)(Current)

N. Tokumasu is an author at Semiconductor Energy Laboratory (Japan) specializing in engineering, surface science, and chemical engineering.

Top concepts

EngineeringSurface ScienceMaterial ScienceChemical EngineeringThin FilmsApplied PhysicsChemistryMaterials EngineeringOzoneSurface Technology

Publications per year

1990–1999

9

Publications

9

Silicon Dioxide Deposition by Atmospheric Pressure and Low‐Temperature CVD Using TEOS and Ozone

K. Fujino, Yuko Nishimoto, N. Tokumasu et al. · Journal of The Electrochemical Society · 1990 · 119 citations

Thin Film Physics, Engineering, Atmospheric Pressure +16

Dependence of Deposition Characteristics on Base Materials in TEOS and Ozone CVD at Atmospheric Pressure

K. Fujino, Yuko Nishimoto, N. Tokumasu et al. · Journal of The Electrochemical Society · 1991 · 34 citations

Engineering, Integrated Circuits, Thin Film Process Technology +25

Doped Silicon Oxide Deposition by Atmospheric Pressure and Low Temperature Chemical Vapor Deposition Using Tetraethoxysilane and Ozone

K. Fujino, Yuko Nishimoto, N. Tokumasu et al. · Journal of The Electrochemical Society · 1991 · 22 citations

Doped Silicon Oxides, Engineering, Atmospheric Pressure +18

Surface Modification of Base Materials for TEOS / O 3 Atmospheric Pressure Chemical Vapor Deposition

K. Fujino, Yuko Nishimoto, N. Tokumasu et al. · Journal of The Electrochemical Society · 1992 · 21 citations · Full text

Engineering, Vacuum Device, Chemical Deposition +20

Thermal desorption spectra of SiO2 films deposited on Si and on thermal SiO2 by tetraethylorthosilicate/O3 atmospheric-pressure chemical vapor deposition

Degang Cheng, Koji Tsukamoto, Hiroshi Komiyama et al. · Journal of Applied Physics · 1999 · 16 citations

Engineering, Chemistry, Chemical Deposition +19

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