IEEE Journal of Solid-State Circuits · 2010 · 32 citations · 17 references
Non-volatile MemoryElectrical EngineeringEngineeringVlsi DesignEmerging Memory TechnologyAdditional MasksComputer EngineeringComputer ArchitectureMemory DevicesWrite ThroughputSemiconductor MemoryCell SelectorMicroelectronicsHardware SystemsMemory ArchitecturePhase Change Memory
A 4 Mb embedded phase change memory macro has been developed in a 90 nm 6-ML CMOS technology. The storage element has been integrated using 3 additional masks with respect to process baseline. The cell selector is implemented by a standard LV nMOS device, achieving a cell size of 0.29 μm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> . A dual-voltage row decoder and a double-path column decoder are introduced, enabling a completely low voltage read operation. A 20b-parallelism write scheme is embedded in the digital controller in order to maximize throughput. In alternative, a power-saving low-parallelism write algorithm can be employed. The macro features a 1.2 V 12 ns read access time and a write throughput of 1 MB/s. Set and reset current distributions showing a good read window are presented and robust reliability results are demonstrated.
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A 45nm generation Phase Change Memory technology
G. Servalli · 2009 · 184 citations
Non-volatile Memory, Engineering, Emerging Memory Technology +17