Concepedia

Publication | Closed Access

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

DOI

14

Citations

9

References

2015

Year

Yuriko Seino, Yusuke Kasahara, Katsutoshi Kobayashi, Ken Miyagi, Shinya Minegishi, Katsuyoshi Kodera, Hideki Kanai, Toshikatsu Tobana, Naoko Kihara, Tomoharu Fujiwara,
Microelectronic Engineering

References

YearCitations

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