Yuriko Seino

Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

Ryuichi Nakatani, Hiroki Takano, Alvin Chandra et al. · ACS Applied Materials & Interfaces · 2017 · 73 citations

Contact hole shrink process using graphoepitaxial directed self-assembly lithography

Yuriko Seino, Hiroki Yonemitsu, Masahiro Kanno et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 48 citations · Full text

Engineering, Electron-beam Lithography, Wet Development Process +18

Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Katsuyoshi Kodera, Shimon Maeda, Satoshi Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Numerical Analysis, Optical Materials, Engineering +17

Sub-30nm via interconnects fabricated using directed self-assembly

Hirokazu Kato, Yuriko Seino, Hiroki Yonemitsu et al. · Microelectronic Engineering · 2013 · 24 citations

Electrical Engineering, Wafer Scale Processing, Engineering +8

Contact hole shrink process using directed self-assembly

Yuriko Seino, Hiroki Yonemitsu, Masahiro Kanno et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 22 citations

Engineering, Mechanical Engineering, Wet Development Process +17