Concepedia

Hiroki Yonemitsu

HY

Statistics

Publications

8

Citations

215

H-Index

8

Active since

2006

Affiliations

Toshiba (Japan)(Current)

Tokyo Electron (Japan)

Hiroki Yonemitsu is an author at Toshiba (Japan) specializing in engineering, microfabrication, and applied physics.

Top concepts

EngineeringMicrofabricationSelf-assemblyApplied Physics3D PrintingMaterial ScienceMicroelectronicsMechanical EngineeringPolymer ScienceElectronic Packaging

Publications per year

2006–2017

8

Publications

8

Contact hole shrink process using graphoepitaxial directed self-assembly lithography

Yuriko Seino, Hiroki Yonemitsu, Masahiro Kanno et al. · Journal of Micro/Nanolithography MEMS and MOEMS · 2013 · 48 citations · Full text

Engineering, Electron-beam Lithography, Wet Development Process +18

Nonadiabatic photochemical reaction and application to photolithography

Hiroki Yonemitsu, Tadashi Kawazoe, Kiyoshi Kobayashi et al. · Journal of Luminescence · 2006 · 41 citations

Photochemistry, Mechanistic Photochemistry, Synthetic Photochemistry +3

Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Katsuyoshi Kodera, Shimon Maeda, Satoshi Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Numerical Analysis, Optical Materials, Engineering +17

Sub-30nm via interconnects fabricated using directed self-assembly

Hirokazu Kato, Yuriko Seino, Hiroki Yonemitsu et al. · Microelectronic Engineering · 2013 · 24 citations

Electrical Engineering, Wafer Scale Processing, Engineering +8

Contact hole shrink process using directed self-assembly

Yuriko Seino, Hiroki Yonemitsu, Masahiro Kanno et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 22 citations

Engineering, Mechanical Engineering, Wet Development Process +17

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