Nonadiabatic photochemical reaction and application to photolithography

Imprint of sub-25 nm vias and trenches in polymers

Stephen Y. Chou, Peter R. Krauss, Preston J. Renstrom · Applied Physics Letters · 1995 · 2.7K citations

Engineering, Porous Polymer, Polymers +20

Using an elastomeric phase mask for sub-100 nm photolithography in the optical near field

John A. Rogers, Kateri E. Paul, Rebecca J. Jackman et al. · Applied Physics Letters · 1997 · 293 citations

Optical Materials, Engineering, Electron-beam Lithography +22

Sub-diffraction-limited patterning using evanescent near-field optical lithography

Maan M. Alkaisi, Richard J. Blaikie, Sharee J. McNab et al. · Applied Physics Letters · 1999 · 190 citations

Photonics, Diffraction Limit, Optical Materials +14

Nonadiabatic photodissociation process using an optical near field

Tadashi Kawazoe, Kiyoshi Kobayashi, S. Takubo et al. · The Journal of Chemical Physics · 2004 · 91 citations

Nanometric Zn Dots, Optical Materials, Engineering +17

Fabrication of a nanometric Zn dot by nonresonant near-field optical chemical-vapor deposition

Tadashi Kawazoe, Yoh Yamamoto, Motoichi Ohtsu · Applied Physics Letters · 2001 · 42 citations

Nanometric Zn Dots, Engineering, Colloidal Nanocrystals +19