Katsuyoshi Kodera

Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Katsuyoshi Kodera, Shimon Maeda, Satoshi Tanaka et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 26 citations

Numerical Analysis, Optical Materials, Engineering +17

Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly

Hiroki Yonemitsu, Yuriko Seino, Hirokazu Kato et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 18 citations

Engineering, Mechanical Engineering, Material Simulation +21

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

Yuriko Seino, Yusuke Kasahara, Katsutoshi Kobayashi et al. · Microelectronic Engineering · 2015 · 14 citations

Engineering, Microfabrication, Self-assembly +6

Dispersive lineshape of the resistively‐detected NMR in the vicinity of Landau level filling ν = 1

Katsuyoshi Kodera, Hisashi Takado, Akira Endo et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2006 · 14 citations

Charge Excitations, Engineering, Spin Systems +22

Directed self-assembly lithography using coordinated line epitaxy (COOL) process

Yuriko Seino, Yusuke Kasahara, Katsutoshi Kobayashi et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2015 · 12 citations

Materials Science, Wafer Scale Processing, Engineering +15