Perpendicular Orientation Control without Interfacial Treatment of RAFT-Synthesized High-χ Block Copolymer Thin Films with Sub-10 nm Features Prepared via Thermal Annealing

Ryuichi Nakatani, Hiroki Takano, Alvin Chandra, +14

ACS Applied Materials & Interfaces

Fabrication of Ridge-and-Groove Servo Pattern Consisting of Self-Assembled Dots for 2.5 $\hbox{Tb/in}^{2}$ Bit Patterned Media

Yoshiyuki Kamata, Akira Kikitsu, Naoko Kihara, +3

IEEE Transactions on Magnetics

Materials ScienceEngineeringDot Pitch DeviationMicrofabricationMaterials Fabrication +12

5 Tdots/in² bit patterned media fabricated by a directed self-assembly mask

Akira Kikitsu, Tomoyuki Maeda, Hiroyuki Hieda, +3

IEEE Transactions on Magnetics

EngineeringPolymer NanotechnologyPattern TransferNanostructured PolymerOptoelectronic Devices +23

Fabrication of 5 Tdot/in.2 bit patterned media with servo pattern using directed self-assembly

Naoko Kihara, Ryousuke Yamamoto, Norikatsu Sasao, +6

Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

EngineeringPolymer NanotechnologyPattern TransferPolymer NanocompositesPolymers +21

EB Resist Materials Consist of Catechol Derivatives.

Naoko Kihara, Satoshi Saito, Tohru Ushirogouchi

Journal of Photopolymer Science and Technology

Materials ScienceMaterials EngineeringCatechol DerivativesEngineeringResistor +4

Positive photosensitive polyimides using polyamic acid esters with phenol moieties

Rumiko Hayase, Naoko Kihara, Naohiko Oyasato, +2

Journal of Applied Polymer Science

Chemical EngineeringPolymer MaterialEngineeringPhotochemistryDissolution Rates +11

Long-range-ordering of self-assembled block copolymer nanodots using EB-drawn guide line and post mixing template

Sumio Hosaka, Takashi Akahane, Miftakhul Huda, +5

Microelectronic Engineering

Materials SciencePolymer MaterialPost Mixing TemplateEngineeringBlock Co-polymers +7

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

Yuriko Seino, Yusuke Kasahara, Katsutoshi Kobayashi, +10

Microelectronic Engineering

EngineeringMicrofabricationSelf-assemblyMechanical EngineeringFabrication Technique +4

Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers

Hiroki Takano, Lei Wang, Yūki Tanaka, +9

Journal of Photopolymer Science and Technology

EngineeringNanostructured PolymerChemistryBlock Copolymer LithographyPolymer Material +14

Effect of acid evaporation in chemically amplified resists on insoluble layer formation.

Naoko Kihara, Satoshi Saito, Tohru Ushirogouchi

Journal of Photopolymer Science and Technology