Concepedia

Tohru Ushirogouchi

TU

8

Publications

183

Citations

8

H-Index

1994

Active since

Affiliations

Toshiba (Japan)(Current)

Tohru Ushirogouchi is an author at Toshiba (Japan) specializing in engineering, applied physics, and chemistry.

Top concepts

EngineeringChemistryApplied PhysicsMaterial ScienceChemical KineticsChemical EngineeringExcimer LasersOptoelectronicsPolymer ScienceOptical Materials

Publications per year

1994–2002

8

Publications

8

<title>Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists</title>

Koji Asakawa, Tohru Ushirogouchi · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 41 citations

Chemical Engineering, Chemical Amplification, Amine Additives +10

<title>Mechanism of amine additive in chemically amplified resist visualized by using Monte Carlo simulation</title>

Tohru Ushirogouchi, Koji Asakawa, Akinori Hongu · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1995 · 33 citations

Chemical Engineering, Environmental Chemistry, Engineering +13

Highly Transparent Chemically Amplified ArF Excimer Laser Resists by Absorption Band Shift for 193 nm Wavelength

Takuya Naito, Koji Asakawa, Naomi Shida et al. · Japanese Journal of Applied Physics · 1994 · 27 citations

Nm Wavelength, Photonics, Laser Exposure +15

Novel ArF Excimer Laser Resists Based on Menthyl Methacrylate Terpolymer.

Naomi Shida, Tohru Ushirogouchi, Kohji ASAKAWA · Journal of Photopolymer Science and Technology · 1996 · 25 citations · Full text

Materials Science, Arf Emission, Optical Materials +12

EB Resist Materials Consist of Catechol Derivatives.

Naoko Kihara, Satoshi Saito, Tohru Ushirogouchi · Journal of Photopolymer Science and Technology · 1998 · 18 citations · Full text

Materials Science, Materials Engineering, Catechol Derivatives +6

Rows per page

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