Tohru Ushirogouchi - Concepedia

Author

Tohru Ushirogouchi

Toshiba (Japan)

Also Known As

TOHRU USHIROGOUCHI, Tohru USHIROGOUCHI, Tohru Ushirogouchi, Tohru Ushirogouchi Tohru Ushirogouchi

Publications

257

Citations

H-Index

Concepts

All Affiliations

Toshiba (Japan)

About

Tohru Ushirogouchi is an author at Toshiba (Japan) specializing in engineering, applied physics, and chemistry.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	7	7	171
2	Applied Physics	5	5	114
3	Chemistry	5	5	142
4	Chemical Engineering	3	3	90
5	Medicine	1	1	41

Tohru Ushirogouchi

Publications

183

Citations

H-Index

Page 1

	Year	Citations
<title>Effect of basic additives on sensitivity and diffusion of acid in chemical amplification resists</title> Koji Asakawa, Tohru Ushirogouchi Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Chemical EngineeringChemical AmplificationAmine AdditivesEngineeringResistor	1995	41
<title>Mechanism of amine additive in chemically amplified resist visualized by using Monte Carlo simulation</title> Tohru Ushirogouchi, Koji Asakawa, Akinori Hongu Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE Chemical EngineeringEnvironmental ChemistryEngineeringAmine AdditiveDiffusion Resistance	1995	33
Highly Transparent Chemically Amplified ArF Excimer Laser Resists by Absorption Band Shift for 193 nm Wavelength Takuya Naito, Koji Asakawa, Naomi Shida, Japanese Journal of Applied Physics Nm WavelengthPhotonicsLaser ExposureOptical MaterialsEngineering	1994	27
Novel ArF Excimer Laser Resists Based on Menthyl Methacrylate Terpolymer. Naomi Shida, Tohru Ushirogouchi, Kohji ASAKAWA Journal of Photopolymer Science and Technology Materials ScienceArf EmissionOptical MaterialsEngineeringOptical Properties	1996	25
EB Resist Materials Consist of Catechol Derivatives. Naoko Kihara, Satoshi Saito, Tohru Ushirogouchi Journal of Photopolymer Science and Technology Materials ScienceMaterials EngineeringCatechol DerivativesEngineeringResistor	1998	18
Effect of remaining solvent on sensitivity, diffusion of acid, and resolution in chemical amplification resists Koji Asakawa, Tohru Ushirogouchi Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena EngineeringChemical AnalysisSynthetic PhotochemistryChemistryEnvironmental Photochemistry	1995	16
Effect of acid evaporation in chemically amplified resists on insoluble layer formation. Naoko Kihara, Satoshi Saito, Tohru Ushirogouchi Journal of Photopolymer Science and Technology	1995	12
A new positive electron-beam resist material composed of catechol derivatives Satoshi Saito, Naoko Kihara, Tohru Ushirogouchi Microelectronic Engineering Materials EngineeringMaterials ScienceCatechol DerivativesEngineeringSpecific Resistance	2002	11

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