Novel ArF Excimer Laser Resists Based on Menthyl Methacrylate Terpolymer.

Abstract

Recent advances in the single-layer resist for forming finer patterns have led us to a search for new resist materials for the ArF excimer laser. We describe a novel, environmentally friendly, single-layer resist based on a menthyl methacrylate terpolymer which has good dry etch resistance and high transparency in the wavelength region of ArF emission.