Tomoharu Fujiwara

<title>Nikon EB stepper: its system concept and countermeasures for critical issues</title>

Kazuaki Suzuki, Tomoharu Fujiwara, Kazunari Hada et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2000 · 31 citations

Critical Issues, Engineering, Electron-beam Lithography +17

Temporally-separated ultrafast-emission dynamics of neutral and cationic molecules in guanine and its derivative aqueous solutions

Tomoharu Fujiwara, Yukio Kamoshida, Ryuji Morita et al. · Journal of Photochemistry and Photobiology B Biology · 1997 · 25 citations

Temporally-separated Ultrafast-emission Dynamics, Excited State Property, Localized Excited State +13

A novel simple sub-15nm line-and-space patterning process flow using directed self-assembly technology

Yuriko Seino, Yusuke Kasahara, Katsutoshi Kobayashi et al. · Microelectronic Engineering · 2015 · 14 citations

Engineering, Microfabrication, Self-assembly +6

Spacer process and alignment assessment for SADP process

Ludovic Lattard, Martin McCallum, Robert D. Morton et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 12 citations

Engineering, Electron-beam Lithography, Microscopy +21

Defect studies of resist process for 193nm immersion lithography

Tomoyuki Ando, Katsumi Ohmori, Satoshi Maemori et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 11 citations

Engineering, Electron-beam Lithography, Beam Lithography +16