Concepedia

Reticle Design

Reticle Design is a methodological framework in photolithography engineering that specifies the arrangement and geometric configuration of patterns on a photomask to enable precise transfer of circuit designs onto semiconductor substrates during integrated circuit fabrication.

98

Publications

11.5K

Citations

510

Authors

89

Institutions

Publications per year

2017–2026

7

Parents

Publications

98

Reticular synthesis and the design of new materials

Omar M. Yaghi, M. O’Keeffe, N.W. Ockwig et al. · Nature · 2003 · 9K citations

, , +9

Wafer-scale silicon photonic switches beyond die size limit

Tae Joon Seok, Kyungmok Kwon, Johannes Henriksson et al. · Optica · 2019 · 208 citations · Full text

, , +17

60-GHz 64- and 256-Elements Wafer-Scale Phased-Array Transmitters Using Full-Reticle and Subreticle Stitching Techniques

Samet Zihir, Ozan Dogan Gurbuz, A. Kar-Roy et al. · IEEE Transactions on Microwave Theory and Techniques · 2016 · 168 citations

, , +16

EUV lithography performance for manufacturing: status and outlook

Alberto Pirati, Rudy Peeters, Daniel Smith et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 90 citations

, , +15

Progress on EUV pellicle development

Carmen Zoldesi, K. Bal, Brian Blum et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2014 · 85 citations

, , +10

1–5 of 98

Authors

510

  1. HM
    H. Meiling

    ASML (Netherlands), Netherlands

    6 publications · 270 citations

    6

    h-index

  2. JT
    Jens Timo Neumann

    Carl Zeiss (Germany), Germany

    4 publications · 151 citations

    4

    h-index

  3. CA
    Chris A. Mack

    KLA (United States), United States

    4 publications · 74 citations

    4

    h-index

  4. JF
    Jo Finders

    ASML (Netherlands), Netherlands

    4 publications · 163 citations

    4

    h-index

  5. GM
    Gabriel M. Rebeiz

    University of California San Diego, United States

    3 publications · 219 citations

    3

    h-index

1–5 of 510

Institutions

89

  1. ASML (Netherlands)

    Veldhoven, The Netherlands

    14 h-index

    106 publications

    5.4K citations

  2. Carl Zeiss (Germany)

    Oberkochen, Germany

    10 h-index

    31 publications

    949 citations

  3. ASML (United States)

    Chandler, United States

    6 h-index

    16 publications

    585 citations

  4. IBM (United States)

    Armonk, United States

    5 h-index

    14 publications

    287 citations

  5. Intel (United States)

    Santa Clara, United States

    5 h-index

    21 publications

    910 citations

  6. IMEC

    Leuven, Belgium

    5 h-index

    25 publications

    494 citations

  7. KLA (United States)

    Milpitas, United States

    4 h-index

    9 publications

    114 citations

  8. University of California San Diego

    San Diego, United States

    4 h-index

    11 publications

    462 citations

1–8 of 89

Venues

  1. 21

    h-index

  2. 5

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 3 publications · 45 citations

    3

    h-index

  4. Optical Engineering

    3 publications · 58 citations

    3

    h-index

  5. Mechatronics

    2 publications · 44 citations

    2

    h-index

1–5