Concepedia

Resist Contrast

Resist Contrast is a lithographic performance metric that quantifies the ability of a photoresist to produce distinct solubility changes in response to varying electron doses during Electron Beam Lithography, distinguishing it from other resist characteristics by specifically characterizing the steepness of the resist’s response curve in the dose–solubility relationship.

202

Publications

6.3K

Citations

703

Authors

154

Institutions

Publications per year

2017–2026

8

Parents

Publications

202

Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography

Joel K. W. Yang, Karl K. Berggren · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2007 · 206 citations

, , +13

Deep-ultraviolet interferometric lithography as a tool for assessment of chemically amplified photoresist performance

William D. Hinsberg, Frances A. Houle, John A. Hoffnagle et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1998 · 163 citations

, , +12

Point exposure distribution measurements for proximity correction in electron beam lithography on a sub-100 nm scale

S. A. Rishton, D. P. Kern · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1987 · 152 citations

, , +14

Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist

W. Henschel, Yordan M. Georgiev, H. Kurz · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 151 citations

, , +13

Developer Characteristics of Poly‐(Methyl Methacrylate) Electron Resist

James S. Greeneich · Journal of The Electrochemical Society · 1975 · 148 citations

, , +15

1–5 of 202

Authors

703

  1. LF
    L. F. Thompson

    AT&T (United States), United States

    6 publications · 212 citations

    6

    h-index

  2. YE
    Yasin Ekinci

    Paul Scherrer Institute, Switzerland

    6 publications · 177 citations

    6

    h-index

  3. AR
    Adam R. Pawloski

    Advanced Micro Devices (United States), United States

    5 publications · 138 citations

    5

    h-index

  4. CA
    Chris A. Mack

    KLA (United States), United States

    4 publications · 71 citations

    4

    h-index

  5. MV
    Michaela Vockenhuber

    Paul Scherrer Institute, Switzerland

    4 publications · 146 citations

    4

    h-index

1–5 of 703

Institutions

154

  1. IBM Research - Thomas J. Watson Research Center

    Yorktown Heights, United States

    10 h-index

    30 publications

    1.2K citations

  2. Paul Scherrer Institute

    Villigen, Switzerland

    9 h-index

    24 publications

    675 citations

  3. NTT (Japan)

    Tokyo, Japan

    9 h-index

    21 publications

    838 citations

  4. Massachusetts Institute of Technology

    Cambridge, United States

    7 h-index

    21 publications

    1.2K citations

  5. University of Cambridge

    Cambridge, United Kingdom

    6 h-index

    14 publications

    391 citations

  6. IBM Research - Almaden

    San Jose, United States

    6 h-index

    21 publications

    1.7K citations

  7. AT&T (United States)

    Bedminster, United States

    5 h-index

    39 publications

    857 citations

  8. University of California, Berkeley

    Berkeley, United States

    5 h-index

    8 publications

    142 citations

1–8 of 154

Venues

  1. 27

    h-index

  2. 17

    h-index

  3. Japanese Journal of Applied Physics

    JJAP · 14 publications · 261 citations

    12

    h-index

  4. 12

    h-index

  5. 9

    h-index

1–5