L. F. Thompson - Concepedia

Author

L. F. Thompson

AT&T (United States)

Also Known As

L F Thompson, L F. Thompson, L. F. THOMPSON, L. F. Thompson, L.F. Thompson, Liam Thompson, Thompson, Liam

Publications

Citations

H-Index

Concepts

All Affiliations

AT&T (United States)University of Minnesota Missouri University of Science and Technology Nokia (United States)

About

L. F. Thompson is an author at AT&T (United States) specializing in engineering, materials science, and polymer science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	21	29	1.7K
2	Applied Physics	17	19	1.3K
3	Natural Sciences	2	2	32
4	Health Sciences	1	1	45
5	Biomedical Engineering	1	1	76

L. F. Thompson

Publications

1.8K

Citations

H-Index

Page 1

	Year	Citations
Introduction to microlithography L. F. Thompson, C. Grant Willson, M. J. Bowden CERN Document Server (European Organization for Nuclear Research) Materials ScienceLithographic ProcessEngineeringElectron-beam LithographyBeam Lithography	1994	513
Ion beam exposure characteristics of resists: Experimental results Thomas M. Hall, Alfred Wagner, L. F. Thompson Journal of Applied Physics EngineeringChemistryConducting PolymerChemical EngineeringPolymer Material	1982	103
The plasma polymerization of vinyl monomers. II. A detailed study of the plasma polymerization of styrene L. F. Thompson, K. G. Mayhan Journal of Applied Polymer Science Materials ScienceChemical EngineeringEngineeringMacromolecular EngineeringPolymer Science	1972	84
A New Family of Positive Electron Beam Resists—Poly(Olefin Sulfones) L. F. Thompson, M. J. Bowden Journal of The Electrochemical Society Materials ScienceConducting PolymerNew FamilyEngineeringElectronic Materials	1973	78
Electron irradiation of poly(olefin sulfones). Application to electron beam resists M. J. Bowden, L. F. Thompson Journal of Applied Polymer Science EngineeringOlefin SulfonesElectron-beam LithographyResponsive PolymersOrganic Chemistry	1973	78
Polymer Resist Systems for Photo- And Electron Lithography L. F. Thompson, Robert E. Kerwin Annual Review of Materials Science Materials ScienceMetallic MaterialsAdditive Manufacturing TechniquesEngineeringElectron-beam Lithography	1976	77
The plasma polymerization of vinyl monomers. I. The design, construction, and operation of an inductively coupled plasma generator and preliminary studies with nine monomers L. F. Thompson, K. G. Mayhan Journal of Applied Polymer Science EngineeringVinyl FluorideCoupled Rf FieldResponsive PolymersBiomedical Engineering	1972	76
Ion beam exposure characteristics of resists Thomas M. Hall, Alfred Wagner, L. F. Thompson Journal of Vacuum Science and Technology Materials ScienceConducting PolymerElectrical EngineeringChemical EngineeringEngineering	1979	74
Photo- and thermochemistry of select 2,6-dinitrobenzyl esters in polymer matrixes: studies pertaining to chemical amplification and imaging Thomas X. Neenan, F. M. Houlihan, Elsa Reichmanis, Macromolecules Macromolecular ChemistryEngineeringPolymer MatrixesAltmetric Attention ScoreSynthetic Photochemistry	1990	52
Fundamental aspects of electron beam lithography. I. Depth-dose response of polymeric electron beam resists R. D. Heidenreich, L. F. Thompson, E. D. Feit, Journal of Applied Physics EngineeringElectron-beam LithographyResponsive PolymersElectron DiffractionFundamental Aspects	1973	51

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