Concepedia

Isotropic Etching

Isotropic Etching is a chemical etching process in micromachining and thin film etching that uniformly removes material in all directions, distinguished from anisotropic etching by its lack of directional selectivity.

162

Publications

7.9K

Citations

709

Authors

204

Institutions

Publications per year

2017–2026

43

Parents

Publications

162

Etch rates for micromachining processing-part II

K.R. Williams, Kapil Gupta, Matthew Wasilik · Journal of Microelectromechanical Systems · 2003 · 1K citations

, , +17

Overview of atomic layer etching in the semiconductor industry

Keren J. Kanarik, Thorsten Lill, Eric A. Hudson et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2015 · 604 citations · Full text

, , +15

Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

Haruhiko Abe, Masahiro Yoneda, Nobuo Fujiwara · Japanese Journal of Applied Physics · 2008 · 316 citations · Full text

, , +17

The etching of silicon with XeF2 vapor

Harold F. Winters, J. W. Coburn · Applied Physics Letters · 1979 · 303 citations

, , +17

Advanced etching of silicon based on deep reactive ion etching for silicon high aspect ratio microstructures and three-dimensional micro- and nanostructures

Frédéric Marty, Lionel Rousseau, Bassam Saadany et al. · Microelectronics Journal · 2005 · 300 citations

, , +17

1–5 of 162

Authors

709

  1. SB
    S. Borel

    Commissariat à l'Énergie Atomique et aux Énergies Alternatives, France

    6 publications · 134 citations

    6

    h-index

  2. HD
    Hui Deng

    Southern University of Science and Technology, China

    6 publications · 143 citations

    6

    h-index

  3. HH
    Henry H. Radamson

    KTH Royal Institute of Technology, Sweden

    4 publications · 144 citations

    4

    h-index

  4. RY
    Rong Yi

    Southern University of Science and Technology, China

    4 publications · 108 citations

    4

    h-index

  5. YW
    Yuelin Wang

    Shanghai Institute of Microsystem and Information Technology, China

    3 publications · 79 citations

    3

    h-index

1–5 of 709

Institutions

204

  1. Southern University of Science and Technology

    Shenzhen, China

    7 h-index

    32 publications

    826 citations

  2. Commissariat à l'Énergie Atomique et aux Énergies Alternatives

    Paris, France

    7 h-index

    19 publications

    321 citations

  3. University of Chinese Academy of Sciences

    Beijing, China

    5 h-index

    28 publications

    1.3K citations

  4. Hitachi (Japan)

    Tokyo, Japan

    5 h-index

    29 publications

    626 citations

  5. CEA Grenoble

    Grenoble, France

    5 h-index

    16 publications

    282 citations

  6. Institute of Microelectronics

    Beijing, China

    5 h-index

    70 publications

    4.2K citations

  7. Oxford Instruments (United Kingdom)

    Abingdon, United Kingdom

    4 h-index

    10 publications

    206 citations

  8. University of California, Berkeley

    Berkeley, United States

    4 h-index

    9 publications

    1.7K citations

1–8 of 204

Venues

  1. Journal of Micromechanics and Microengineering

    JMM · 15 publications · 623 citations

    13

    h-index

  2. 9

    h-index

  3. Journal of Microelectromechanical Systems

    8 publications · 1.4K citations

    8

    h-index

  4. Journal of The Electrochemical Society

    JES · 8 publications · 283 citations

    8

    h-index

  5. Japanese Journal of Applied Physics

    JJAP · 7 publications · 448 citations

    7

    h-index

1–5