Nobuo Fujiwara

Developments of Plasma Etching Technology for Fabricating Semiconductor Devices

Haruhiko Abe, Masahiro Yoneda, Nobuo Fujiwara · Japanese Journal of Applied Physics · 2008 · 303 citations · Full text

Materials Engineering, Electrical Engineering, Plasma Electronics +15

Regeneration failure of lakeshore plants under an artificially altered water regime

Jun Nishihiro, Shigenari MIYAWAKI, Nobuo Fujiwara et al. · Ecological Research · 2004 · 189 citations

4H-SiC Trench MOSFET with Bottom Oxide Protection

Yasuhiro Kagawa, Nobuo Fujiwara, Katsutoshi Sugawara et al. · Materials science forum · 2014 · 98 citations

Electrical Engineering, Engineering, Switching Loss +10

Investigation of ash damage to ultralow-k inorganic materials

Kazumasa Yonekura, Shigenori Sakamori, Kinya Goto et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2004 · 89 citations

Engineering, Ash Damage, Fly Ash +17

Profile Control of poly-Si Etching in Electron Cyclotron Resonance Plasma

Nobuo Fujiwara, Takahiro Maruyama, Masahiro Yoneda · Japanese Journal of Applied Physics · 1995 · 70 citations

Electrical Engineering, Engineering, Electron-beam Lithography +13