High-density Interconnects
High-Density Interconnects is a miniaturized interconnection technology in chip and microwave packaging that enables significantly increased circuit density and improved signal integrity through fine-pitch, multi-layered, and closely spaced conductive pathways.
437
Publications
17.4K
Citations
2.1K
Authors
339
Institutions
Publications per year
2017–2026
67
Variants
Hdi
437
Interconnect scaling-the real limiter to high performance ULSI
M. Bohr · 2002 · 549 citations
Full copper wiring in a sub-0.25 μm CMOS ULSI technology
D. Edelstein, J. Heidenreich, R. Goldblatt et al. · 2002 · 352 citations
Engineering, Computer Engineering, Electrical Engineering +17
1–5 of 437
2.1K
16
h-index
11
h-index
11
h-index
8
h-index
7
h-index
1–5 of 2.1K
339
IBM (United States)
Armonk, United States
20 h-index
204 publications
15.5K citations
Georgia Institute of Technology
Atlanta, United States
20 h-index
214 publications
6.6K citations
IMEC
Leuven, Belgium
15 h-index
132 publications
3.3K citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
14 h-index
89 publications
7.7K citations
Intel (United States)
Santa Clara, United States
13 h-index
92 publications
6.8K citations
Motorola (United States)
Schaumburg, United States
10 h-index
20 publications
420 citations
Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Paris, France
9 h-index
57 publications
1.5K citations
STMicroelectronics (France)
Montrouge, France
9 h-index
80 publications
2.3K citations
1–8 of 339
19 publications · 811 citations
16
h-index
12 publications · 248 citations
12
h-index
10 publications · 357 citations
10
h-index
11 publications · 235 citations
10
h-index
9 publications · 470 citations
9
h-index
1–5