Gate-all-around Transistors

Gate-All-Around Transistors is a type of metal-oxide-semiconductor field-effect transistor in which the gate electrode fully surrounds the semiconductor channel in a three-dimensional architecture, enabling superior electrostatic control and enhanced scalability compared to planar or fin-based transistor geometries.

772

Publications

34.2K

Citations

3.1K

Authors

493

Institutions

Publications per year

2017–2026

353

Authors

3.1K

  1. NS
    Navab Singh

    Institute of Microelectronics, Singapore

    26 publications · 2.4K citations

    21

    h-index

  2. NC
    Nadine Collaert

    IMEC, Belgium

    23 publications · 939 citations

    17

    h-index

  3. NH
    Naoto Horiguchi

    IMEC, Belgium

    20 publications · 1K citations

    16

    h-index

  4. DK
    Dim‐Lee Kwong

    Institute of Microelectronics, Singapore

    19 publications · 1K citations

    16

    h-index

  5. GE
    Geert Eneman

    IMEC, Belgium

    16 publications · 1.1K citations

    15

    h-index

1–5 of 3.1K

Venues

  1. IEEE Transactions on Electron Devices

    136 publications · 6.8K citations

    46

    h-index

  2. IEEE Electron Device Letters

    81 publications · 5.6K citations

    40

    h-index

  3. Solid-State Electronics

    28 publications · 1K citations

    22

    h-index

  4. Applied Physics Letters

    20 publications · 623 citations

    18

    h-index

  5. Silicon

    21 publications · 688 citations

    17

    h-index

1–5