Gate-all-around Transistors
Gate-All-Around Transistors is a type of metal-oxide-semiconductor field-effect transistor in which the gate electrode fully surrounds the semiconductor channel in a three-dimensional architecture, enabling superior electrostatic control and enhanced scalability compared to planar or fin-based transistor geometries.
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Publications
34.2K
Citations
3.1K
Authors
493
Institutions
Publications per year
2017–2026
353
Variants
Gaa TransistorsGaafetGaafets
772
Stacked nanosheet gate-all-around transistor to enable scaling beyond FinFET
N. Loubet, Terence B. Hook, P. Montanini et al. · 2017 · 988 citations
Silicon-on-insulator 'gate-all-around device'
J.-P. Colinge, M.-H. Gao, A. Romano‐Rodrı́guez et al. · 2002 · 350 citations
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493
IMEC
Leuven, Belgium
30 h-index
644 publications
40.3K citations
Institute of Microelectronics
Beijing, China
25 h-index
424 publications
18.8K citations

National Yang Ming Chiao Tung University
Hsinchu, Taiwan
23 h-index
187 publications
6.5K citations
Institute of Microelectronics
Singapore, Singapore
23 h-index
194 publications
18.2K citations

Chinese Academy of Sciences
Beijing, China
23 h-index
327 publications
15.5K citations
Samsung (South Korea)
Seoul, South Korea
21 h-index
228 publications
28.8K citations
Commissariat à l'Énergie Atomique et aux Énergies Alternatives
Paris, France
20 h-index
200 publications
9.4K citations
Institut polytechnique de Grenoble
Grenoble, France
20 h-index
158 publications
7.8K citations
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136 publications · 6.8K citations
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81 publications · 5.6K citations
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28 publications · 1K citations
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20 publications · 623 citations
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21 publications · 688 citations
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