Concepedia

Etch Lag

Etch Lag is a phenomenon in thin film etching processes whereby the etching rate of a feature lags behind its intended profile due to insufficient reactant flux or byproduct removal, particularly in high-aspect-ratio structures, resulting in incomplete or delayed pattern transfer.

52

Publications

2K

Citations

192

Authors

54

Institutions

Publications per year

2017–2026

2

Variants

Arde

Parents

Publications

52

BSM 7: RIE lag in high aspect ratio trench etching of silicon

Henri Jansen, M. de Boer, Remco J. Wiegerink et al. · Microelectronic Engineering · 1997 · 144 citations · Full text

, , +11

Aspect ratio dependent etching lag reduction in deep silicon etch processes

Shouliang Lai, D. Johnson, Russ Westerman · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2006 · 108 citations

, , +17

A clinical trial comparing the failure rates of directly bonded brackets using etch times of 15 or 60 seconds

Alan P. Kinch, Helen Taylor, Rosie Warltler et al. · American Journal of Orthodontics and Dentofacial Orthopedics · 1988 · 108 citations

, , +9

Ultracompact polarization converter with a dual subwavelength trench built in a silicon-on-insulator waveguide

Aitor V. Velasco, M. L. Calvo, Pavel Cheben et al. · Optics Letters · 2012 · 104 citations · Full text

, , +17

Substrate bias effects in high-aspect-ratio SiO2 contact etching using an inductively coupled plasma reactor

A. C. Westerheim, A. H. Labun, J. H. Dubash et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1995 · 91 citations

, , +16

1–5 of 52

Authors

192

  1. KW
    Ki‐Woong Whang

    Seoul National University, South Korea

    3 publications · 45 citations

    3

    h-index

  2. MT
    Mutumi Tuda

    Mitsubishi Electric (Japan), Japan

    3 publications · 55 citations

    3

    h-index

  3. GS
    G. S. Oehrlein

    University of Maryland, College Park, United States

    3 publications · 181 citations

    3

    h-index

  4. RW
    Rosie Warltler

    University of Wales, United Kingdom

    2 publications · 142 citations

    2

    h-index

  5. KO
    Kouichi Ono Kouichi Ono

    Mitsubishi Electric (Japan), Japan

    2 publications · 28 citations

    2

    h-index

1–5 of 192

Institutions

54

  1. Applied Materials (United States)

    Santa Clara, United States

    6 h-index

    18 publications

    591 citations

  2. Mitsubishi Electric (Japan)

    Tokyo, Japan

    4 h-index

    14 publications

    230 citations

  3. University at Albany, State University of New York

    Albany, United States

    3 h-index

    5 publications

    291 citations

  4. Massachusetts Institute of Technology

    Cambridge, United States

    3 h-index

    8 publications

    316 citations

  5. Seoul National University

    Seoul, South Korea

    3 h-index

    11 publications

    155 citations

  6. University of Wales

    Cardiff, United Kingdom

    2 h-index

    3 publications

    250 citations

  7. VTT Technical Research Centre of Finland

    Espoo, Finland

    2 h-index

    4 publications

    184 citations

  8. Virginia Tech

    Blacksburg, United States

    2 h-index

    12 publications

    459 citations

1–8 of 54

Venues

  1. Japanese Journal of Applied Physics

    JJAP · 12 publications · 228 citations

    10

    h-index

  2. 9

    h-index

  3. 7

    h-index

  4. Journal of Micromechanics and Microengineering

    JMM · 3 publications · 85 citations

    3

    h-index

  5. Journal of The Electrochemical Society

    JES · 3 publications · 70 citations

    3

    h-index

1–5