Ki‐Woong Whang

Mechanism of high luminous efficient discharges with high pressure and high xe-content in AC PDP

Woo Joon Chung, Bhum Jae Shin, Tae Jun Kim et al. · IEEE Transactions on Plasma Science · 2003 · 86 citations

Natural Sciences, Electrical Engineering, Physics +17

The effects of magnetic fields on a planar inductively coupled argon plasma

Hojun Lee, Il-Dong Yang, Ki‐Woong Whang · Plasma Sources Science and Technology · 1996 · 70 citations

Natural Sciences, Electrical Engineering, Physics +15

Electron ejection from MgO thin films by low energy noble gas ions: Energy dependence and initial instability of the secondary electron emission coefficient

Kyoung Sup Moon, Jihwa Lee, Ki‐Woong Whang · Journal of Applied Physics · 1999 · 69 citations

Natural Sciences, Materials Science, Physics +14

Mechanism of selective SiO2/Si etching with fluorocarbon gases (CF4, C4F8) and hydrogen mixture in electron cyclotron resonance plasma etching system

Hyun-Ho Doh, Junghun Kim, Seok-Hyun Lee et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 47 citations

Natural Sciences, Materials Engineering, Materials Science +14

Vacuum ultraviolet emission characteristics from He–Ne–Xe gas discharge in an alternating current plasma display panel cell

Jeong Hyun Seo, Heui Seob Jeong, Joo Yul Lee et al. · Journal of Applied Physics · 2000 · 46 citations

Natural Sciences, Chemistry, Physics +14