Concepedia

Damage-free Etching

Damage-Free Etching is a thin film etching technique that selectively removes material without inducing physical or chemical damage to the underlying or remaining layers, distinguishing itself from conventional etching methods by preserving the structural and electronic integrity of the substrate.

75

Publications

2.3K

Citations

389

Authors

103

Institutions

Publications per year

2017–2026

18

Parents

Publications

75

Pulse-time modulated plasma discharge for highly selective, highly anisotropic and charge-free etching

Seiji Samukawa, Tetsu Mieno · Plasma Sources Science and Technology · 1996 · 152 citations

, , +14

Ultimate Top-down Etching Processes for Future Nanoscale Devices: Advanced Neutral-Beam Etching

Seiji Samukawa · Japanese Journal of Applied Physics · 2006 · 142 citations · Full text

, , +13

Pulse–time-modulated electron cyclotron resonance plasma discharge for highly selective, highly anisotropic, and charge-free etching

Seiji Samukawa, Hiroto Ohtake, Tetsu Mieno · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1996 · 105 citations

, , +14

Amorphous-InGaZnO4 Thin-Film Transistors with Damage-Free Back Channel Wet-Etch Process

Sung Hun Ryu, Youngjae Park, Mallory Mativenga et al. · ECS Solid State Letters · 2012 · 87 citations

, , +17

Damage-free selective etching of Si native oxides using NH3/NF3 and SF6/H2O down-flow etching

Hitoshi Nishino, N. Hayasaka, H. Okano · Journal of Applied Physics · 1993 · 82 citations

, , +17

1–5 of 75

Authors

389

  1. SS
    Seiji Samukawa

    Tohoku University, Japan

    17 publications · 778 citations

    14

    h-index

  2. KS
    Keizô Suzuki

    Hitachi (Japan), Japan

    3 publications · 64 citations

    3

    h-index

  3. MR
    Mikhaı̈l R. Baklanov

    IMEC, Belgium

    3 publications · 77 citations

    3

    h-index

  4. SN
    Shuichi Noda

    Tohoku University, Japan

    3 publications · 86 citations

    3

    h-index

  5. SD
    Stefan De Gendt

    IMEC, Belgium

    3 publications · 76 citations

    3

    h-index

1–5 of 389

Institutions

103

  1. Tohoku University

    Sendai, Japan

    12 h-index

    45 publications

    1.3K citations

  2. NEC (Japan)

    Tokyo, Japan

    8 h-index

    20 publications

    883 citations

  3. Hitachi (Japan)

    Tokyo, Japan

    5 h-index

    18 publications

    391 citations

  4. IMEC

    Leuven, Belgium

    4 h-index

    14 publications

    359 citations

  5. National Institute of Advanced Industrial Science and Technology

    Tsukuba, Japan

    4 h-index

    30 publications

    681 citations

  6. Hokkaido University

    Sapporo, Japan

    3 h-index

    7 publications

    174 citations

  7. Centre National de la Recherche Scientifique

    Paris, France

    3 h-index

    11 publications

    314 citations

  8. Groupe de Recherches sur l'Energétique des Milieux Ionisés

    Orléans, France

    3 h-index

    11 publications

    330 citations

1–8 of 103

Venues

  1. Japanese Journal of Applied Physics

    JJAP · 8 publications · 276 citations

    8

    h-index

  2. 7

    h-index

  3. Applied Physics Letters

    7 publications · 193 citations

    7

    h-index

  4. Journal of Applied Physics

    4 publications · 161 citations

    4

    h-index

  5. IEEE Transactions on Electron Devices

    3 publications · 87 citations

    3

    h-index

1–5