J.-H. Ku

A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

X. Chen, S. Samavedam, Vijay Narayanan et al. · 2008 · 112 citations

Low-power Electronics, Low Power Applications, Electrical Engineering +14

65nm cmos technology for low power applications

An Steegen, R. Mo, R. Mann et al. · 2006 · 44 citations

Low-power Electronics, Low Power Applications, Electrical Engineering +13

Competitive and cost effective high-k based 28nm CMOS technology for low power applications

F. Arnaud, Aaron Thean, M. Eller et al. · 2009 · 43 citations

Low-power Electronics, Low Power Applications, Electrical Engineering +14

Novel Enhanced Stressor with Graded Embedded SiGe Source/Drain for High Performance CMOS Devices

M. Ieong, J. Sudijono, J.-H. Ku et al. · 2006 · 25 citations

Electrical Engineering, Semiconductor Device, Engineering +13

High Performance Transistors Featured in an Aggressively Scaled 45nm Bulk CMOS Technology

Z. Luo, N. Rovedo, B. Phoong et al. · 2007 · 20 citations

Low-power Electronics, Competitive Sram, Electrical Engineering +15