W. Li

High performance 14nm SOI FinFET CMOS technology with 0.0174µm ² embedded DRAM and 15 levels of Cu metallization

C-H. Lin, B. Greene, J. Cai et al. · 2014 · 129 citations

Engineering, Computer Engineering, Electrical Engineering +9

A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

X. Chen, S. Samavedam, Vijay Narayanan et al. · 2008 · 113 citations

Engineering, Computer Engineering, Electrical Engineering +16

A 45 nm CMOS node Cu/Low-k/ Ultra Low-k PECVD SiCOH (k=2.4) BEOL Technology

S. Sankaran, S. Arai, R. Augur et al. · 2006 · 22 citations

Engineering, Electrical Engineering, Materials Science +17

ArF excimer laser resists based on fluoroalcohol

Hiroshi Itô, Hoa D. Truong, Robert D. Allen et al. · Polymers for Advanced Technologies · 2006 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +8

New layout dependency in high-k/Metal Gate MOSFETs

M. Hamaguchi, Deleep R. Nair, D. Jaeger et al. · 2011 · 13 citations

Engineering, Electrical Engineering, Electronic Materials +16