Deleep R. Nair

A cost effective 32nm high-K/ metal gate CMOS technology for low power applications with single-metal/gate-first process

X. Chen, S. Samavedam, Vijay Narayanan et al. · 2008 · 112 citations

Low-power Electronics, Low Power Applications, Electrical Engineering +14

A manufacturable dual channel (Si and SiGe) high-k metal gate CMOS technology with multiple oxides for high performance and low power applications

Siddarth Krishnan, U. Kwon, N. Moumen et al. · 2011 · 81 citations

Sige Channels, Low Power Applications, Engineering +16

32nm general purpose bulk CMOS technology for high performance applications at low voltage

F. Arnaud, J. Liu, Yong Meng Lee et al. · 2008 · 56 citations

Low-power Electronics, Electrical Engineering, Engineering +12

Scaling of 32nm low power SRAM with high-K metal gate

Haining Yang, Robert Wong, R. Hasumi et al. · 2008 · 49 citations

Electrical Engineering, Engineering, Vlsi Design +14

Competitive and cost effective high-k based 28nm CMOS technology for low power applications

F. Arnaud, Aaron Thean, M. Eller et al. · 2009 · 43 citations

Low-power Electronics, Low Power Applications, Electrical Engineering +14