S. Sankaran

Schottky barrier diodes for millimeter wave detection in a foundry CMOS process

S. Sankaran, O K.K. · IEEE Electron Device Letters · 2005 · 142 citations

Semiconductor Technology, Foundry Cmos Process, Electrical Engineering +13

High Performance 45-nm SOI Technology with Enhanced Strain, Porous Low-k BEOL, and Immersion Lithography

P. Agnello, T. Ivers, C. Warm et al. · 2006 · 115 citations

Engineering, Vlsi Design, Enhanced Strain +21

Line edge roughness and spacing effect on low-k TDDB characteristics

F. Chen, J. R. Lloyd, Kaushik Chanda et al. · 2008 · 46 citations

Electrical Engineering, Engineering, Hardware Reliability +9

A high performance 90nm SOI technology with 0.992 μm/sup 2/ 6T-SRAM cell

Mukesh Khare, S.H. Ku, R. A. Donaton et al. · 2003 · 43 citations

Low-power Electronics, Materials Science, Electrical Engineering +14

A 45 nm CMOS node Cu/Low-k/ Ultra Low-k PECVD SiCOH (k=2.4) BEOL Technology

S. Sankaran, S. Arai, R. Augur et al. · 2006 · 22 citations

Materials Science, Materials Engineering, Electrical Engineering +15