Susan Fan

Integration of EUV lithography in the fabrication of 22-nm node devices

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 49 citations · Full text

Insertion strategy for EUV lithography

Obert R. Wood, John Arnold, Timothy A. Brunner et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 30 citations

Short Wavelength Optic, Optical Materials, Engineering +19

EUV lithography at the 22nm technology node

Obert R. Wood, Chiew-Seng Koay, Karen Petrillo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2010 · 22 citations

Technology Node, Electrical Engineering, Wafer Scale Processing +15

Middle of line RC performance study at the 7 nm node

Susan Fan, James Hsueh-Chung Chen, Vimal Kamineni et al. · 2017 · 17 citations

Engineering, Vlsi Design, Radio Frequency +18

Process Window Centering for 22 nm Lithography

Ralf Buengener, Carol Boye, Bryan Rhoads et al. · IEEE Transactions on Semiconductor Manufacturing · 2011 · 11 citations

Engineering, Electron-beam Lithography, Pwc Methodology +10