Statistics
Publications
2
Citations
110
H-Index
2
Active since
2011
Affiliations
IBM (United States)(Current)
Carol Boye is an author at IBM (United States) specializing in engineering, computer engineering, and electron beam lithography.
Publications per year
2011–2014
2
2
Process Window Centering for 22 nm Lithography
Ralf Buengener, Carol Boye, Bryan Rhoads et al. · IEEE Transactions on Semiconductor Manufacturing · 2011 · 11 citations
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