Ralf Buengener

In-line E-beam wafer metrology and defect inspection: the end of an era for image-based critical dimensional metrology? New life for defect inspection

Eric Solecky, Oliver D. Patterson, Andrew Stamper et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2013 · 27 citations

Engineering, Electron-beam Lithography, Measurement +21

Process Window Centering for 22 nm Lithography

Ralf Buengener, Carol Boye, Bryan Rhoads et al. · IEEE Transactions on Semiconductor Manufacturing · 2011 · 11 citations

Engineering, Electron-beam Lithography, Pwc Methodology +10

Defect inspection strategies for 14 nm semiconductor technology

Ralf Buengener · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2012 · 10 citations

Engineering, Inspection, Microscopy +17

In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions

Eric Solecky, Allen Rasafar, Jason Cantone et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 10 citations